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Photo chemical machining resist
Photoresists have always been and will continue to be an essential part of material processing in the photochemical machining industry (PCM).
Image definition is a critical aspect of forming chemically etched parts.Photoresists form the desired pattern and act as an etch resist to define that pattern. The technology has evplved through the last century resulting in high-resolution resists that cover a multitude of applications. They are available in two basic forms, liquid and dry film. Though they are applied differently to the metal substrates, they have many of the same basic processing principles once they are adhered to the metal surface.
Liquid resists are photopolymers that are applied by various tchniques such that an even coating is distributed over the metal surface. Dry film is a photopolymer resist that has been coated to a controlled thickness on polyester by the dry film manufacturer. An interleaf sheet of polyethylene is applied after the coating on polyester to allow the dry film to be supplied in roll form.
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